June 2021 Report on Global Semiconductor Lithography Equipment Market Overview, Size, Share and Trends 2021-2026

(Heraldkeepers via Comtex)

Global Semiconductor Lithography Equipment Market was valued at USD 14.5 Billion in 2019 and expected to grow with a CAGR 9.54% over the forecast period 2021-2027. Electrical components and appliances such as memory chips and computer microprocessors contain electrical circuits at the nanometer level that are designed by the deployment of lithographic semiconductor equipment. In developing new technological solutions which involve semiconductors circuit integration, semiconductor lithographic equipment plays a crucial role. The market growth is driven by rising innovation by Specialist Equipment Vendors and rising demand for Miniaturization and Extra Functionality by Electric Vehicles. Vendors have developed increasingly advanced CD (Critical dimension) measuring techniques to meet industry’s rising demand for miniaturization. For example, the high-technology company Hitachi has previously announced the addition of the advanced SEM CG7300 CD Measurement, providing an improved measurement precision and higher quality. The new equipment was intended to mass production of generation units of 5nm and to the development of EUV lithography generation units of 3nm. Furthermore, as Integrated Circuits (IC) become more widely used, the market for low-cost, high-performance devices grows. The Semiconductor Industry Association estimates that the semiconductor sector will be worth USD 433.03 billion in 2020. Despite that, complexity of Pattern in Manufacturing Process hinders the growth of market over the forecasting period 2020-2027.

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Regional Analysis
In terms of revenues from semiconductor lithography equipment, North America is expected to capture the largest market share, owing to a rising demand for integrated advancement circuits and new technologies that is expected to lead to the growth of the market in the respective region in the prediction period. However, the demand for semiconductor lithography devices in the Asia-Pacific region is driving by continuous increase in demand for compact electronic devices.

Key Players in Global Semiconductor Lithography Equipment Market
Nikon Corporation
Canon Inc.
ASML Holding NV
Veeco Instruments Inc.
SUSS MicroTec SE
Shanghai Micro Electronics Equipment (Group) Co., Ltd.
EV Group (EVG)
JEOL, Ltd.
Onto Innovation (Rudolph Technologies, Inc.)
Neutronix Quintel Inc. (NXQ)

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The objective of the study is to define market sizes of different segments & countries in recent years and to forecast the values to the coming eight years. The report is designed to incorporate both qualitative and quantitative aspects of the industry within each of the regions and countries involved in the study. Furthermore, the report also caters the detailed information about the crucial aspects such as driving factors & challenges which will define the future growth of the market. Additionally, the report shall also incorporate available opportunities in micro markets for stakeholders to invest along with the detailed analysis of competitive landscape and product offerings of key players. The detailed segments and sub-segment of the market are explained below:
By Type:
Deep Ultraviolet Lithography (DUV) (ArFi, ArF dry,KrF, i-line)
Extreme Ultraviolet Lithography (EUV)
By Application:
Advanced Packaging
MEMS Devices
LED Devices

By Region:
North America
U.S.
Canada
Europe
UK
Germany
France
Spain
Italy

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Asia Pacific
China
India
Japan
Australia

Latin America
Brazil
Mexico
Rest of LA
Rest of the World

Furthermore, years considered for the study are as follows:

Historical year - 2017, 2018
Base year - 2019
Forecast period - 2020 to 2027

Target Audience of Global Semiconductor Lithography Equipment Market in Market Study:

Key Consulting Companies & Advisors
Large, medium-sized, and small enterprises
Venture capitalists
Value-Added Resellers (VARs)
Third-party knowledge providers
Investment bankers
Investors

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Table of Contents

Chapter 1. Executive Summary
1.1. Market Snapshot
1.2. Global & Segmental Market Estimates & Forecasts, 2019-2027 (USD Billion)
1.2.1. Semiconductor Lithography Equipment Market, by Type, 2019-2027 (USD Billion)
1.2.2. Semiconductor Lithography Equipment Market, by Application, 2019-2027 (USD Billion)
1.2.3. Semiconductor Lithography Equipment Market, By Region, 2019-2027 (USD Billion)
1.3. Key Trends
1.4. Estimation Methodology
1.5. Research Assumption
Chapter 2. Global Semiconductor Lithography Equipment Market Definition and Scope
2.1. Objective of the Study
2.2. Market Definition & Scope
2.2.1. Scope of the Study
2.2.2. Industry Evolution
2.3. Years Considered for the Study
2.4. Currency Conversion Rates

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Chapter 3. Global Semiconductor Lithography Equipment Market Dynamics
3.1. Semiconductor Lithography Equipment Market Impact Analysis (2018-2027)
3.1.1. Market Drivers
3.1.1.1. Rising Innovation by Specialist Equipment Vendors
3.1.1.2. Increasing Demand for Miniaturization and Extra Functionality by Electric Vehicles
3.1.2. Market Challenges
3.1.2.1. Complexity of Pattern in Manufacturing Process
3.1.3. Market Opportunities
3.1.3.1. Rising demand for advance mobile devices
Chapter 4. Global Semiconductor Lithography Equipment Market Industry Analysis
4.1. Porter's 5 Force Model
4.1.1. Bargaining Power of Suppliers
4.1.2. Bargaining Power of Buyers
4.1.3. Threat of New Entrants
4.1.4. Threat of Substitutes
4.1.5. Competitive Rivalry
4.1.6. Futuristic Approach to Porter's 5 Force Model (2018-2027)
4.2. PEST Analysis
4.2.1. Political
4.2.2. Economic
4.2.3. Social
4.2.4. Technological
4.3. Investment Adoption Model
4.4. Analyst Recommendation & Conclusion

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Chapter 5. Global Semiconductor Lithography Equipment Market, by Type
5.1. Market Snapshot
5.2. Global Semiconductor Lithography Equipment Market by Source, Performance – Potential Analysis
5.3. Global Semiconductor Lithography Equipment Market Estimates & Forecasts by Type 2018-2027 (USD Billion)
5.4. Semiconductor Lithography Equipment Market, Sub Segment Analysis
5.4.1. Deep Ultraviolet Lithography (DUV) (ArFi, ArF dry,KrF, i-line)
5.4.2. Extreme Ultraviolet Lithography (EUV)

….continued

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